Extreme Ultraviolet Optical Coatings Development at Luxor

Recent results concerning development of EUV optical coatings will be reviewed. EUV optical coatings with high reflectivity are strongly needed for space, for EUV lithography, for laboratory applications. In our laboratory an extensive study ranging from design, deposition and characterization of different structured coatings is carried on. Optical constants from soft x-ray to EUV and VUV spectral regions have been derived for different materials deposited with several techniques. A-periodic ML for EUV lithography applications have been designed and experimentally tested showing considerable improvement in reflectivity and insensitivity to cap-layer oxidation. A-periodic ML with suitable phase chirping and reflectivity curve have been realized in order to reflect ultrashort pulses, like those emitted in HOH generation experiments. These structures can reflect the HOH spectrum with pulse compression in attosec. regime. Periodic ML with suitable capping layers for solar space observations have been designed, deposited and characterized. These structures have the property of high reflectivity at some specific wavelength coupled with strong rejection ratio for other wavelengths.