Bulk and surface inhomogeneity of r.f. sputtered ITO films: an ellipsometric study

ENEA Research Centre, Optical Coatings Group, Via Anguillarese 301, 00123 Rome, Italy

Physics Department, University of Rome Tor Vergata and INSTM, via della Ricerca Scientifica 1, 00133 Rome, Italy

annak@enea.it

Abstract

Tin-doped indium oxide (ITO) films have been prepared by r.f. sputtering technique in pure Ar and Ar+O2 atmospheres. Additional substrate heating during the deposition was used for a half of the samples. The influence of both deposition conditions and post-annealing treatment on film inhomogeneity was studied using multiangle spectroscopic ellipsometry. The structural and microstructural properties of the ITO films have been compared to the film inhomogeneity values.

Keywords

Thin Films Optical Materials Spectroscopy
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@inproceedings{dgao110-p27, title = {Bulk and surface inhomogeneity of r.f. sputtered ITO films: an ellipsometric study}, author = {A. Krasilnikova Sytchkova, S. Schutzmann}, booktitle = {DGaO-Proceedings, 110. Jahrestagung}, year = {2009}, publisher = {Deutsche Gesellschaft für angewandte Optik e.V.}, issn = {1614-8436}, note = {Poster P27} }
110. Annual Conference of the DGaO · Brescia · 2009