Layout and optical simulation of a confocal lithography setup enhanced with a solid immersion lens (SIL) by using the optical design software Zemax

It will be reported about an existing confocal lithography setup to be enhanced with a solid immersion lens (SIL) concerning an increase in resolution. For this, it is necessary to know the aspheric parameters of the focussing aspheric lens within the existing setup. Since these parameters are not provided by the manufacturer, they have to be determined by means of the geometrics of the aspheric lens by using the mathematic software Mathematica. On the basis of these results, it is possible to simulate and analyse the optical path within the enhanced system by applying the optical design software Zemax. As a result of optimisation a resolution enhanced lithography setup for structuring technical surfaces will be proposed.