DGaO·Proceedings ISSN 1614-8436
DE
Poster P34

New photosensitive polymers based on MMA+PQ

Dominik Hoff1, Elen Tolstik1, Vladislav Matusevich1, Richard Kowarschik1, Yuri Matusevich2, Leonid Krul2, L. B. Yakimtsova2
  1. 1Institute of Applied Optics and Biophysics, Friedrich Schiller University Jena
  2. 2Research Institute for Physical Chemical Problems, Belarusian State University (Belarus)

dominik [dot] hoff [at] uni-jena [dot] de

We present a series of investigations of photopolymers based on Methylmethacrylate (MMA) and Phenanthrenequinone (PQ). The possibility to improve important properties of the polymers like thermal stability and adhesion on silica glass is shown. The examined PQ doped materials are Polymethylmethacrylate (PMMA), Co-Polymer of MMA+AA (AA-Acrylic acid), CP(MMA+MAA) (MAA-Methylmethacrylamide) and CP(MMA+MA) (MA-Methacrylic acid). The behavior of the diffraction efficiencies and the absorption spectra during illumination and baking is demonstrated. Furthermore the opportunity of storing holographic information is shown.

Manuscript not yet submitted. The submission phase is currently closed. 
@inproceedings{hoff2009p34,
  author     = {Hoff, Dominik and Tolstik, Elen and Matusevich, Vladislav and Kowarschik, Richard and Matusevich, Yuri and Krul, Leonid and Yakimtsova, L. B.},
  title      = {{New photosensitive polymers based on MMA+PQ}},
  booktitle  = {DGaO-Proceedings 2009},
  series     = {DGaO-Proceedings},
  eventtitle = {110. Jahrestagung der DGaO},
  eventdate  = {2009-06-02/2009-06-05},
  venue      = {Brescia},
  publisher  = {Deutsche Gesellschaft für angewandte Optik e.V.},
  year       = {2009},
  pages      = {P34},
  langid     = {english},
  url        = {https://dgao-proceedings.de/paper/110-p34}
}
110. Annual Conference of the DGaO · Brescia · 2009