Microscope Projection Photolithography for functional optical and plasmonic components

We present a fast and fexible technique for the controlled generation of 2D micro- and nanostructures. This technique is based on optical projection photolithography using commercially available microscope components. A Chromium photomask is placed within the image plane of the microscope and illuminated by a short wavelength LED at 365 nm. In combination with a high NA (1.4) immersion oil objective high resolution structuring is achieved. Minimum feature sizes of 150 nm have been realized and are demonstrated within this paper. Furthermore optical and plasmonic components are generated and were investigated in respect to their funcionality.