The Structural and Optical Characterization of PbTeO Semiconductor Thin Film

Department of Metallurgy and Materials Engineering, Faculty of Engineering, Karabük University,78050, Karabük, Turkey;
2 Department of Science Education, Faculty of Education, Erciyes University, 38039, Kayseri, Turkey

fatmameydaneri@karabuk.edu.tr

Abstract

In this study, PbTeO semiconductor thin film has been produced by Chemical Bath Deposition (CBD) method onto glass substrates keeping 3 h at a bath temperature of 50 °C. The surface of the film was investigated with SEM. The structural properties of the thin film were analyzed with X-ray diffraction (XRD). The optical band gap (Eg), optical transmission (T %), reflectivity (R %), absorption coefficient (α), refraction index (n), extinction coefficient (k), dielectric constant (ɛ) of the thin film were investigated depending on deposition time and solution temperature by UV-VIS. The film thickness was measured with AFM (tapping mode). The absorption coefficient (α) was used to calculate the optical and electrical conductivities σopt and σe.

Keywords

Surfaces Thin Films Optical Materials
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@inproceedings{dgao117-p5, title = {The Structural and Optical Characterization of PbTeO Semiconductor Thin Film}, author = {F. Meydaneri Tezel, İ. A. Kariper}, booktitle = {DGaO-Proceedings, 117. Jahrestagung}, year = {2016}, publisher = {Deutsche Gesellschaft für angewandte Optik e.V.}, issn = {1614-8436}, note = {Poster P5} }
117. Jahrestagung der DGaO · Hannover · 2016