Advancement in two-photon grayscale lithography

We present recent advancements in two-photon grayscale lithography (2GL®). In contrast to one-photon grayscale lithography, for 2GL®, the exposed volume pixel is strongly confined to the vicinity of the laser focus allowing for a truly 3-dimensional dose control with very high spatial resolution. Discrete and accurate steps as well as essentially continuous topographies can be printed with increased throughput, on any substrate, and without the need for additional lithography steps or mask fabrication. We update on throughput and quality levels of the method. As demonstrators we fabricate and characterize optics masters for replication technologies like nanoimprint lithography.