Fabrication of resonant grating pulse compression element with 99% flat top efficiency for high average power femtosecond laser machining
Hubert Curien Labor UMR CNRS 5516, Saint-Etienne, France
2 Leibniz-Institut für Oberflächenmodifizierung Leipzig
3 Institute of Solid State Physics, Sofia, Bulgaria
4 Institute of General Physics IOFAN, Moscow, Russia
Abstract
Top hat diffraction efficiency in an all-dielectric SiO2/HfO2 grating femtosecond pulse compression grating is demonstrated with a close to 100% flat top over more than 20 nm around 800 nm wavelength. New perspectives are open for high average power femtosecond laser machining. The Poster shows the design, fabrication and the diffraction efficiency results of the element focusing on the fabrication details.
Keywords
Mikrooptik
Gitter
Fertigung optischer Systeme
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Der Vortragende kann unter /einreichen mit Code (
P44) und der hinterlegten E-Mail-Adresse einen Upload-Link anfordern.
@inproceedings{dgao108-p44,
title = {Fabrication of resonant grating pulse compression element with 99% flat top efficiency for high average power femtosecond laser machining},
author = {O. Parriaux, R. Fechner, M. Flury, S. Tonchev, N. Lyndin, A. Schindler},
booktitle = {DGaO-Proceedings, 108. Jahrestagung},
year = {2007},
publisher = {Deutsche Gesellschaft für angewandte Optik e.V.},
issn = {1614-8436},
note = {Poster P44}
}
108. Annual Conference of the DGaO · Heringsdorf · 2007